Electronic Effects At Interfaces In Cu (cr, mo, w, ta, re) Multilayers
نویسندگان
چکیده
منابع مشابه
1 ELECTRONIC EFFECTS AT INTERFACES IN Cu - Cr , Mo , W , Ta , Re MULTILAYERS
Interfacial electronic effects between Cu and the transition metals Cr, Mo, W, Ta, Re, are investigated by determining the strength of the white line absorption resonances on the L3,2 edges of Cu in Cu5/TM5 multilayers. X-ray absorption (XAS) was performed to study the white lines, which are directly related to the unoccupied states of Cu in the multilayers. The metallic multilayers are 2 nm in...
متن کاملCorrelation effects in Co / Cu and Fe / Cr magnetic multilayers
The electronic structure of Co/Cu(001) and Fe/Cr(001) magnetic multilayers has been investigated within the local density approximation combined with dynamical mean field theory. Our calculation shows enhanced density of states at the Fermi level, suggesting that electronic correlations might play an important role in the transport properties of multilayers. Typeset using REVTEX 1
متن کاملProcessing and Microstructure of Cr-Ta and Cr-Ta-Mo Composites
The Cr-Ta alloy with an eutectic structure has a good combination of high strength and oxidation resistance at elevated temperatures up to 1,200°C. It is an ideal candidate for ultrahigh-temperature applications. However, the material shows low ductility and fracture toughness at room temperature. An effective way to improve the ductility and fracture toughness is to obtain an aligned microstru...
متن کاملElectrical conductivity of dense Al, Ti, Fe, Ni, Cu, Mo, Ta, and W plasmas.
We report measurements of electrical conductivity of eight metals in the plasma state at densities ranging from 0.002 to 0.5 times solid density, and with internal energy from 2 to 30 kJ/gm. Data are presented as functions of internal energy and specific volume. Conductivity is observed to fall as the plasma expands for fixed internal energy, and for all but tantalum and titanium shows a minimu...
متن کاملINTERFACIAL ELECTRONIC CHARGE TRANSFER AND DENSITY OF STATES IN SHORT PERIOD Cu/Cr MULTILAYERS
Nanometer period metallic multilayers are ideal structures to investigate electronic phenomena at interfaces between metal films since interfacial atoms comprise a large atomic fraction of the samples. The multilayers studied were fabricated by magnetron sputtering and consist of bilayers from 1.9 nm to 3.3 nm. X-ray diffraction, cross-section TEM and plan-view TEM show the Cu layers to have a ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: MRS Proceedings
سال: 1998
ISSN: 0272-9172,1946-4274
DOI: 10.1557/proc-524-279